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  nitride silicon Datasheet PDF File

For nitride silicon Found Datasheets File :: 1770    Search Time::2.25ms    
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    2SC5006 2SC5006-T1 2SC5006NE85619 2SC5006-T1-T2

NEC[NEC]
NEC Corp.
NEC, Corp.
Part No. 2SC5006 2SC5006-T1 2SC5006NE85619 2SC5006-T1-T2
OCR Text ...ity. This is achieved by direct nitride passivated base surface, process (NEST2 process) which is an NEC proprietary fabrication technique. FEATURES * Low Voltage Use. * High fT * Low Cre * Low NF : 4.5 GHz TYP. (@ VCE = 3 V, IC = 7 mA,...
Description    NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD
SC70/µDFN, Single/Dual Low-Voltage, Low-Power µP Reset Circuits
NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD NPN硅外延晶体管3引脚超超级迷你模
NPN epitaxial-type silicon transistor

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    2SC5007 2SC5007-T1 2SC5007NE68119 2SC5007-T1-T2

http://
NEC[NEC]
NEC Corp.
Part No. 2SC5007 2SC5007-T1 2SC5007NE68119 2SC5007-T1-T2
OCR Text ...ity. This is achieved by direct nitride passivated base surface, process (NEST2 process) which is an NEC proprietary fabrication technique. FEATURES * Low Voltage Use. * High fT * Low Cre * Low NF : 7.0 GHz TYP. (@ VCE = 3 V, IC = 7 mA,...
Description NPN epitaxial-type silicon transistor
NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD
Discrete

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    2SC5008 2SC5008-T1 2SC5008NE68019 2SC5008-T1-T2

NEC Corp.
NEC[NEC]
Part No. 2SC5008 2SC5008-T1 2SC5008NE68019 2SC5008-T1-T2
OCR Text ...ity. This is achieved by direct nitride passivated base surface, process (NEST2 process) which is an NEC proprietary fabrication technique. PACKAGE DIMENSIONS in millimeters 1.6 0.1 0.8 0.1 2 0.5 1.6 0.1 1.0 0.2+0.1 -0 0.3 +0.1 -0 0...
Description NPN epitaxial-type silicon transistor
NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD
SC70/µDFN, Single/Dual Low-Voltage, Low-Power µP Reset Circuits

File Size 59.73K  /  10 Page

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    2SC5009 2SC5009-T1 2SC5009-T1-T2

NEC[NEC]
NEC Corp.
Part No. 2SC5009 2SC5009-T1 2SC5009-T1-T2
OCR Text ...ity. This is achieved by direct nitride passivated base surface process (NEST3 process) which is an NEC proprietary new fabrication technique. 1.6 0.1 1.0 PACKAGE DIMENSIONS in milimeters 1.6 0.1 0.8 0.1 2 0.2+0.1 -0 0.5 0.3 +0.1 -0 ...
Description NPN epitaxial-type silicon transistor
NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD

File Size 57.57K  /  10 Page

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    2SC5010 2SC5010-T1 2SC5010-T1-T2

NEC Corp.
Part No. 2SC5010 2SC5010-T1 2SC5010-T1-T2
OCR Text ...ity. This is achieved by direct nitride passivated base surface process (NEST3 process) which is an NEC proprietary fabrication technique. FEATURES * Low Voltage Use. * High fT * Low Cre * Low NF : 12.0 GHz TYP. (@ VCE = 3 V, IC = 10 mA...
Description NPN epitaxial-type silicon transistor
NPN silicon EPITAXIAL TRANSISTOR 3 PINS ULTRA SUPER MINI MOLD
128 x 128 pixel format, LED or EL Backlight available

File Size 59.95K  /  10 Page

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    INA-01170

Agilent (Hewlett-Packard)
HP[Agilent(Hewlett-Packard)]
Part No. INA-01170
OCR Text ...icon bipolar process which uses nitride self-alignment, submicrometer lithography, trench isolation, ion implantation, gold metallization and polyimide intermetal dielectric and scratch protection to achieve excellent performance, uniformit...
Description Low Noise, Cascadable silicon Bipolar MMIC Amplifier
Low Noise/ Cascadable silicon Bipolar MMIC Amplifier

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    MAX811TEUS

Maxim Integrated Products
Part No. MAX811TEUS
OCR Text ...7 x 31 mils Si3N4/SiO2 (silicon nitride/ silicon dioxide) Aluminum/Copper/Si None 1.2 microns (as drawn) 1.2 microns (as drawn) 5 mil. Sq. SiO2 Wafer Saw V. Quality Assurance Information A. Quality Assurance Contacts: Jim Pedicord (Relia...
Description PLASTIC ENCAPSULATED DEVICES

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    UPC8178TB UPC8179 UPC8179TB UPC8179TB-E3 UPC8128TB UPC8151TB UPC8152TB UPC8179TB1 PC8179TB-E3

NEC[NEC]
Part No. UPC8178TB UPC8179 UPC8179TB UPC8179TB-E3 UPC8128TB UPC8151TB UPC8152TB UPC8179TB1 PC8179TB-E3
OCR Text ...his process uses direct silicon nitride passivation film and gold electrodes. These materials can protect the chip surface from pollution and prevent corrosion/migration. Thus, this IC has excellent performance, uniformity and reliability. ...
Description silicon MMIC LOW CURRENT AMPLIFIER FOR MOBILE COMMUNICATIONS

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    UPC8179TK UPC8179TK-E3

NEC Corp.
California Eastern Labs
NEC[NEC]
Part No. UPC8179TK UPC8179TK-E3
OCR Text ...his process uses direct silicon nitride passivation film and gold electrodes. These materials can protect the chip surface from pollution and prevent corrosion/ migration. Thus this IC has excellent performance uniformity and reliability. N...
Description silicon MMIC LOW CURRENT AMPLIFIER FOR MOBILE COMMUNICATIONS

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    MSA-9970

Avago Technologies, Ltd.
HP[Agilent(Hewlett-Packard)]
Agilent (Hewlett-Packard)
Part No. MSA-9970
OCR Text ...bipolar MMIC process which uses nitride self-alignment, ion implantation, and gold metallization to achieve excellent performance, uniformity and reliability. The use of an external bias resistor for temperature and current stability also a...
Description Cascadable silicon Bipolar MMIC Amplifier 级联硅双极MMIC放大

File Size 44.98K  /  4 Page

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